Newly released APCVD System for Crystalline Solar Cell volume production to deposit nondoped SiO2 film for Hard Mask and Passivation or to deposit doped SiO2 film for solid diffusion source for high end crystalline solar cells.

Feature

• Developed continuous APCVD system technologies and experience over 40 years at semiconductor wafer process to Crystalline Solar Cell production.
• Higher Productivity □156mm Wafer >1300 pcs/hour, □125mm >2000pcs/hour
• Application: Hard Mask, Solid Diffusion Source, Passivation

Continuous APCVD system is traditionally for semiconductor and solar power cell process. AMAYA Co., Ltd provides APCVD System for SiH4 and TEOS Base NSG, PSG, BPSG film deposition in atmospheric pressure.

Feature

• Use trays to transfer substrates.
• SiC trays achieve lower metal contamination.
• Higher throughput
• Plasma damage free deposition
• Many installation record worldwide
  

Lineup

• A6300                  Small footprint and high throughput
• AMAX Series 　   Deposit up to 300mm wafers.
• ATO Series         Use TEOS for Deposition.

AMAYA provides single wafer APCVD system for SiH4 and TEOS base NSG, PSG, BPSG film deposition.

Feature

• Face down method for better gap fill performance.
• Reduce particles by N2 Purge function.
• Plasma Damage Free design by APCVD system.

Lineup

• A200Series 200mm and 300mm wafer deposition.

R&D CVD System is available by AMAYA Co., Ltd.

Feature

Customize configuration available for R&D and pilot production.

Lineup

• D301　Single Wafer CVD system for multiple application.
• D501　Multi Wafer SiH4O3 APCVD System
• D601　Single Wafer APCVD system

Doctor T system is unique MOCVD system with its patented high temp vaporizer system to vaporizes types of materials at higher temperature. The high temp vaporizer was co-developed by Yamagata University and WACOM R&D CORPORATION by challenging controlling very complicated vapor flow with sensitive liquid flow with sensitive temperature control. This system enables various type of existing and new thin film deposition that does not even exist in the market.

Feature

• Patented original clogging free vaporizer.
• Various types of MOCVD film is available.
• Enable filling narrow gap trench with conformal shape.

Lineup

• DOCTOR T 1Single/Twin Chamber MOCVD System

ASM EPSILON® chamber

Square bath / Vertical boat •Reaction tube
Precision fabrication / Chamber and Quartz burner

Silicone Rubber Sheet for General Purpose
Hardness : 50 JIS A
Color : opaque white

Available hardness range is from 10 degrees to 90 degrees. We are able to meet requirements of special characteristics such as conductivity, noncombustibility, heat resistance, heat radiation, high tear resistance.

Ultra-Transparent Silicone Rubber Film (“HT-Film”) is silicone rubber sheet with high transparency like glass.
HT-Film has excellent transparency of light transmission 90%. This can be used also as film, for its thickness is available from 100μm.
Contrary to transparent and hard glass or acrylic board, HT-film is flexible and unbreakable. HT-Film is soft rubber product, so suitable for cushioning material.

We supply silicone rubber sheet of low hardness for masking for lead frame plating.
Hardness 0 ~20 (ASKER C)
Thickness 0.3 ~1.5 mm
Substrate PET film with adhesive tape, Bakelite, Others

Please inquire the specification of hardness, thickness and others.
For detail: PDF:Silicone_RubberMASK.pdf

As to carrier for wafer polishing, we use various materials such as metals (SK, SUS etc.) and resin (Epoxy Glass, Alamide). Also, injection moldings with resin and elastomer around the hole are possible to prevent damages on the wafer surfaces.

Property of parts manufacturing

In order to meet every requirement, skilled workers input an automatic program of processing conditions such as cutting conditions and tool exchanges. Machines work based on data acquired by such program.
Automatic processing by MC and NC enables to produce the parts of great variety efficiently.
Also, we have measuring tools of high precision for inspection and measurement so that we would produce products of high precision and high quality as required.

What is recycling cleaning?

It is thorough cleaning of parts like Depo-Shield used in spattering system and etching system. Process of cleaning is removing the deposition film, giving surface treatment, precise cleaning, and degassing drying. Thoroughly cleaned parts are delivered to customers by airtight packaging.

Characteristic

We supply parts of high reliability.

1. Surface of each part is coated by aluminum film or others by plasma or arc sprays. This improves maintenance of deposition film and decreases particles caused by dropping of particle and coming off of flake.
2. Based on the rising temperature and degassing data, vacuum baking conditions are programmed. This minimizes occurrence of troubles due to degassing from recycling parts.
3. Cleaning is a continuous operation in the clean room from precise cleaning to airtight packaging so that returned parts would be good to be used immediately.
4. Every part is inspected before delivery based on our own inspection standard for quality guarantee.
5. Standardization made it possible to recycle the parts uniformly.

Characteristics

• Full IPA delivery to system
• Stable drying condition
• 99% recovery
• Stable purity
• Full automatic operation
• Full safety system
• Save labor cost
• Compact to small space

Specifications

• Refining ability: up to 15 Litres/Hr.

Wafer Transfer Machine for 2 Wafers Placed Back to Back
This system is full automatic wafer transfer machine with cassette to cassette transfer and back-to-back function included.

TRANS BOY-II
This is a 2-cassette robot of compact design.

Variable Pitch Wafer Transfer Machine (VP/CP)
When using our developed wafer transfer system, a group of 25 wafers can be transferred to a quartz or SiC boat with varying pitch, which greatly contributes to saving of time and labor, a dust-free environment and a higher yield rate.
This transfer system is made of metal and the drive section is designed with covers to be completely dust resistant. It also allows for an orientation flat aligner to be attached.

Notch-Wafer Transfer Machine
This semi-auto wafer transfer machine performs significant notch alignment of 25 pcs of 8” wafers and cassette-to-cassette transferring.

Characteristics

• Compact
• Easy to purification
• ESD effect to wafer / carrier
• Soft DRY against other method
• Affinity for water
• Less influence to human body
• Reusable for better condensation
• Applicable for reprocessing

Specifications

• Wafer size: 4”, 5”, 6”, 8” (12” on request)

Line up

• Stand alone manual type
• In-Line (to cleaner) type

This is a Phtomask Automatic Cleaning System. In order to meet various requirements, 2 models are manufactured.

These 2 models are common in basic ideas. In the 1st block, phtomasks are soaked in heated sulfuric acid in the sulfuric acid bath to be free from organic material on the surface. Here, the surfaces acquire hydrophilicity.
The 2nd block is for scrub cleaning process to eliminate particles of over 1.0μm. The 3rd block is the final cleaning process to remove sub-micron particles in the SC-1 megasonic bath. In the 4th block, IPA vapor dryer performs highly controlled particle-free drying.
Loader/unloader includes cassettes which hold phtomasks either at vertical position or at horizontal position. The loader/unloader transfers photomasks automatically to various processing baths.